Study on the deposition of amorphous silicon and ito thin films for heterojunction solar cell application
Study on the deposition of amorphous silicon and ito thin films for heterojunction solar cell application
In the heterojunction with intrinsic thin-layer (HIT) solar cell structure studied in this work, an intrinsic amorphous silicon (a-Si) layer followed by a n-type amorphous silicon was deposited on a p-type Czochralski (CZ) monocrystalline silicon (c-Si) wafer by plasma enhanced chemical vapor deposition (PECVD) method to form an heterojunction device.